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ISO 8181:2023

ISO 8181:2023

Atomic layer deposition — Vocabulary

Dépôt de couches atomiques — Vocabulaire

Date:
2023-10-16 / Published
ICS:

01.040.25 - Manufacturing engineering (Vocabularies).

25.220.01 - Surface treatment and coating in general.

Committee:
ISO/TC 107 - Metallic and other inorganic coatings

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